The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

8 Plasma Electronics » 8.3 Deposition of thin film and surface treatment

[22a-W611-1~14] 8.3 Deposition of thin film and surface treatment

Tue. Mar 22, 2016 9:00 AM - 12:45 PM W611 (W6)

Jaeho Kim(AIST)

9:45 AM - 10:00 AM

[22a-W611-4] Deposition of NaCl Film by Ion Beam Sputtering

masafumi yamano1, Toru Harigai1, Yu Miyamoto1, Takahiro Imai1, Yoshiyuki Suda1, Hirofumi Takikawa1, Masao Kamiya2, Makoto Taki3, Yushi Hasegawa3, Nobuhiro Tsuji3, Mamiko Nishiuchi4, Hironao Sakaki4, Kiminori Kondo4 (1.Toyohashi Univ., 2.Itoh Opt. Ind., 3.Onward Ceram. Coat., 4.JAEA)

Keywords:ion beam sputtering