[22a-W611-1~14] 8.3 Deposition of thin film and surface treatment

△ [22a-W611-6] Dependence of CCP power on Near-Edge X-Ray Absorption Fine Structure of Amorphous Carbon Films Grown by Plasma-Enhanced Chemical Vapor Deposition

〇(M2)Hirotsugu Sugiura¹, Lingyun Jia¹, Shunichi Sato¹, Hiroki Kondo¹, Kenji Ishikawa¹, Keigo Takeda¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:Amorphous carbon,NEXAFS,PECVD