Kasumi Okabe

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Speaker, Author, Co-Author

Tue. Sep 5, 2017 1:15 PM - 5:45 PM S42 (Conf. Room 2)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.3 Micro/Nano patterning and fabrication

[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

5:00 PM - 5:15 PM

[5p-S42-13] Impact of Resist Residual Layer on Nanoimprint Lithography Performance

〇Kasumi Okabe¹, Kei Kobayashi¹, Masaki Mitsuyasu¹, Kazuya Fukuhara¹, Hirokazu Kato¹, Takuya Kono¹, Jung Wooyung² (1.Toshiba Memory, 2.SK Hynix)