Yuki Okada

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 1:15 PM - 2:45 PM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[7p-A402-1~6] 8.4 Plasma etching

2:00 PM - 2:15 PM

[7p-A402-4] Molecular dynamics simulation of SiO₂ atomic layer etching by fluorocarbon plasmas and Ar plasmas

〇(M2)Yuki Okada¹, Michiro Isobe¹, Satoshi Hamaguchi¹ (1.Osaka Univ.)