Hiroyuki Tanaka

→ Search for Hiroyuki Tanaka in Google Scholar

Speaker, Author, Co-Author

Wed. Sep 6, 2017 1:45 PM - 7:00 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[6p-C21-1~20] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

2:30 PM - 2:45 PM

[6p-C21-4] Analysis of high quality minimal ICP deep trench etching performance by using L-18 method

〇Hiroyuki Tanaka^1,2, Hisato Ogiso^1,2, Shizuka Nakano^1,2, Yoshiyuki Nozawa³, Toshihiro Hayami³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SPPT)

▲