Kenji Ishikawa

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 11:45 AM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[7a-A402-1~10] 8.4 Plasma etching

11:30 AM - 11:45 AM

[7a-A402-10] Chemically chlorine radical-etch of GaN at elevated temperatures

〇Kenji Ishikawa¹, Zecheng Liu¹, Masato Imamura¹, Takayoshi Tsutsumi¹, Hiroki Kondo¹, Osamu Oda¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya University)