Weichen Wen

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Speaker, Author, Co-Author

Tue. Sep 5, 2017 9:00 AM - 12:00 PM C11 (Office 1)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[5a-C11-1~11] 13.3 Insulator technology

6.1と13.3と13.5のコードシェアセッションあり

9:30 AM - 9:45 AM

▼ [5a-C11-3] Near-interface border traps characterization for GeO₂/Ge gate stacks grown by low and high temperature thermal oxidation by using deep-level transient spectroscopy

〇(M2)Weichen Wen¹, Taisei Sakaguchi¹, Keisuke Yamamoto¹, Dong Wang¹, Hiroshi Nakashima² (1.IGSES, Kyushu Univ., 2.GIC, Kyushu Univ.)