Atsushi Azuma

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Speaker, Author, Co-Author

Tue. Sep 5, 2017 1:15 PM - 6:00 PM A202 (202)

Oral presentation
| 6 Thin Films and Surfaces
| 6.3 Oxide electronics

[5p-A202-1~18] 6.3 Oxide electronics

4:15 PM - 4:30 PM

△ [5p-A202-12] Study on the effect of Hf oxide film sputtering condition
on resistive random access memory properties

〇(M1)Atsushi Azuma¹, Ryo Nakajima¹, Hayato Yoshida¹, Tomohiro Shimizu¹, Takeshi Ito¹, Syouso Shingubara¹ (1.Kansai Univ.)