Mikito Nozaki

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Speaker, Author, Co-Author

Tue. Sep 5, 2017 1:45 PM - 6:15 PM C17 (Training Room 2)

Oral presentation
| 13 Semiconductors
| 13.8 Compound and power electron devices and process technology

[5p-C17-1~17] 13.8 Compound and power electron devices and process technology

4:30 PM - 4:45 PM

[5p-C17-11] AlON gate dielectrics deposited by ALD for AlGaN/GaN MOS-HEMTs

〇Mikito Nozaki¹, Kenta Watanabe¹, Takahiro Yamada¹, Hongan Shih², Satoshi Nakazawa², Yoshiharu Anda², Tetsuzo Ueda², Takuji Hosoi¹, Takayoshi Shimura¹, Heiji Watanabe¹ (1.Osaka Univ., 2.Panasonic)

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