Masahito Kurouchi

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Speaker, Author, Co-Author

Tue. Sep 5, 2017 1:15 PM - 6:45 PM S41 (Conf. Room 1)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.2 Applications and technologies of electron beams

[5p-S41-1~20] 7.2 Applications and technologies of electron beams

4:45 PM - 5:00 PM

[5p-S41-13] Investigation of Suitable Approximation Order of 2-variable Function of Exposure Conditions for Half-pitch 50 nm Line-and-space Pattern Formed by Electron-beam Lithography

〇Masahito Kurouchi¹, Manabu Yasui¹, Satoru Kaneko¹ (1.KISTEC)