Hiroaki Kawamura

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Speaker, Author, Co-Author

Wed. Sep 6, 2017 9:00 AM - 12:15 PM A201 (201)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[6a-A201-1~12] 15.6 Group IV Compound Semiconductors (SiC)

9:15 AM - 9:30 AM

[6a-A201-2] Evaluation of amount of Interfacial Oxidation during Thermal Annealing of TEOS - CVD - SiO₂ Film

〇Hiroaki Kawamura¹, Ryu Hasunuma¹, Kikuo Yamabe¹ (1.Tsukuba Univ.)