Ryo Hirose

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Speaker, Author, Co-Author

Wed. Sep 6, 2017 9:00 AM - 12:30 PM A503 (503)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal evaluation, impurities and crystal defects

[6a-A503-1~13] 15.7 Crystal evaluation, impurities and crystal defects

10:15 AM - 10:30 AM

△ [6a-A503-6] Characteristics of Molecular Ion Implanted Epitaxial Wafer (5) - A study of new poly-atomic molecular ion implantation technique -

〇Ryo Hirose¹, Ryosuke Okuyama¹, Takeshi Kadono¹, Ayumi Masada¹, Satoshi Shigematsu¹, Yoshihiro Koga¹, Hidehiko Okuda¹, Kazunari Kurita¹, Naoki Miyamoto² (1.SUMCO CORPORATION, 2.NISSIN ION EQUIPMENT CO,.LTD.)

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