9:00 AM - 9:30 AM [6a-C17-1] [JSAP Paper Award Speech] 1.8mΩ・cm2 vertical GaN-based trench metal–oxide–semiconductor field-effect transistorson a free-standing GaN substrate for 1.2-kV-class operation 〇Tohru Oka1, Tsutomu Ina1, Yukihisa Ueno1, Junya Nishii1 (1.Toyoda Gosei)