Keisuke Kurashima

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 11:00 AM A201 (201)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[7a-A201-1~8] 15.6 Group IV Compound Semiconductors (SiC)

9:45 AM - 10:00 AM

[7a-A201-4] Gas distributor design of SiC wafer etching reactor using ClF₃ gas

〇Keisuke Kurashima¹, Shogo Okuyama¹, Hitoshi Habuka¹, Yoshinao Takahashi², Tomohisa Kato³ (1.Yokohama Nat. Univ., 2.Kanto Denka Kogyo, 3.AIST)