Himake Tominaga

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 12:15 PM C17 (Training Room 2)

Oral presentation
| 21 Joint Session K
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[7a-C17-1~12] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

9:00 AM - 9:15 AM

[7a-C17-1] ZnMgO Films with Mg content controlled by Spin-coated Method

〇Himake Tominaga¹, Kenji Yoshino^1,5, Qing Shen^2,5, Taro Toyota^2,5, Minemoto Takashi^3,5, Yuhei Ogomi^5,4, Syuzi Hayase^4,5 (1.Miyazaki Univ., 2.Univ. of Electro-communications, 3.Ritsumeikan Univ., 4.Kyusyu Inst. Tech, 5.JST-CREST)

Wed. Sep 6, 2017 1:30 PM - 3:30 PM PA5 (P)

Poster presentation
| 13 Semiconductors
| 13.10 Compound solar cells

[6p-PA5-1~24] 13.10 Compound solar cells

1:30 PM - 3:30 PM

[6p-PA5-17] Low temperature growth of ZnO Films under Nitrogen Atmosphere by spin-coated method

〇Himake Tominaga¹, Kenji Yoshino¹, Toshio Naka² (1.Miyazaki Univ., 2.Tosoh Finechem)

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