Toshiyuki Kawaharamura

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 12:15 PM C17 (Training Room 2)

Oral presentation
| 21 Joint Session K
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[7a-C17-1~12] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

9:15 AM - 9:30 AM

[7a-C17-2] Development of novel reaction control technology for thin film fabrication using mist flow generating spacial & time gap II

〇Toshiyuki Kawaharamura^1,2, Phimolphan Rutthongjan¹, Li Liu¹, Misaki Nishi¹, Masahito Sakamoto¹, Yusuke Kobayashi¹, Pradeep E.K.C.², Giang T. Dang², Shota Sato¹, Shunsuke Yamaoki¹, Yoshiaki Nakasone¹, Mariko Ueda¹ (1.School of Sys. Eng., Kochi Univ. of Tech., 2.Res. Inst., Kochi Univ. of Tech.)

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