Riichiro Takaishi

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 12:30 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[7a-C21-1~13] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

10:15 AM - 10:30 AM

[7a-C21-6] Dynamic observation study on the crystallization process of amorphous silicon by means of in situ XRD and TEM

〇Riichiro Takaishi¹, Kiwamu Sakuma¹, Takanori Asano¹, Masumi Saito¹, Hiroki Tanaka¹, Yukiko Daigo², Yutaka Fukushima² (1.Toshiba Corp., 2.Toshiba Nanoanalysis Corp.)

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