Soya Todo

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 3:00 PM - 7:30 PM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma deposition of thin film and surface treatment

[7p-A402-7~23] 8.3 Plasma deposition of thin film and surface treatment

4:30 PM - 4:45 PM

△ [7p-A402-13] In-situ monitoring of SiO_x film deposition rate in reactive sputtering

〇Soya Todo¹, Yoshiyuki Shimosako¹, Tamayo Hiroki¹ (1.Canon Inc.)