Itaru Fujita

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 3:00 PM - 7:30 PM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma deposition of thin film and surface treatment

[7p-A402-7~23] 8.3 Plasma deposition of thin film and surface treatment

5:45 PM - 6:00 PM

△ [7p-A402-17] Dependence of Substrate Bias on DLC Film Prepared by Pulse Arc Jet

〇(M2)Itaru Fujita¹, Yuki Kondo¹, Tsuyoshi Tanimoto¹, Toru Harigai¹, Yoshiyuki Suda¹, Hirofumi Takikawa¹, Hidenobu Gonda², Yasuhiro Hadano³, Masao Kamiya⁴ (1.Toyohashi Univ. Technol., 2.OSG.Corp., 3.Kojima Ind. Corp., 4.Itoh Opt. Ind. Co., Ltd.)

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