Masanaga Fukasawa

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 1:15 PM - 2:45 PM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[7p-A402-1~6] 8.4 Plasma etching

1:30 PM - 1:45 PM

[7p-A402-2] Control of ITO etch rate by using Hydrogen-induced Modified Layer

Akiko Hirata¹, 〇Masanaga Fukasawa¹, Kazunori Nagahata¹, Hu Li², Tomoko Ito², Kazuhiro Karahashi², Satoshi Hamaguchi², Tetsuya Tatsumi¹ (1.Sony Semiconductor Solutions Corp., 2.Osaka Univ.)

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