Isao Mori

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 1:15 PM - 2:45 PM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[7p-A402-1~6] 8.4 Plasma etching

2:30 PM - 2:45 PM

△ [7p-A402-6] Improvement of Etching Process Distribution Controllability within a Wafer by Multi Gas Injection System

〇Isao Mori¹, Motohiro Tanaka¹, Tetsuo Kawanabe², Soichiro Eto², Naoki Yasui¹ (1.Hitachi High-Technologies Corp., 2.Hitachi, Ltd.)