Atsushi Tanide

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 3:00 PM - 7:30 PM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma deposition of thin film and surface treatment

[7p-A402-7~23] 8.3 Plasma deposition of thin film and surface treatment

3:30 PM - 3:45 PM

[7p-A402-9] Plasma-enhanced CVD growth of GaN films

〇Atsushi Tanide^1,3, Motohiro Kohno^1,3, Shigeru Takatsuji¹, Akira Horikoshi^1,3, Shohei Nakamura¹, Kazuo Kinose¹, Soichi Nadahara¹, Masazumi Nishikawa², Akinori Ebe², Kenji Ishikawa³, Masaru Hori³ (1.SCREEN Holdings, 2.EMD Corp., 3.Nagoya Univ.)

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