Characteristic change of GeO <sub>2</sub> / Ge interface by Hf-Post Matallization Annealing

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Tue. Sep 5, 2017 9:00 AM - 12:00 PM C11 (Office 1)

Masato Koyama(TOSHIBA), Akio Ohta(Nagoya Univ.)

10:00 AM - 10:15 AM

〇Haruka Fujiwara¹, Yoshitaka Iwazaki¹, Tomo Ueno¹, Hiroshi Yamada¹, Namiki Mitaro¹ (1.Tokyo Univ. of Agri. & Tech)

Keywords:insulator