[5p-C11-1~10] 13.3 絶縁膜技術

▼ [5p-C11-6] Low-temperature Oxidation Characteristics of Si using SrTi_xMg_1-xO_3-δ Catalyst

〇(D)HsiangFang Sun¹、Akihiro Ikeda¹、Tanemasa Asano¹ (1.Kyushu Univ.)

キーワード：catalyst, oxidation

Following our successful results on low temperature oxidation of 4H-SiC, this work investigates oxidation characteristic of catalytic thermal oxidation using the perovskite oxide, SrTi_xMg_1-xO_3-δ, as catalyst. Si is used as oxidation target and is set beside the catalyst in a furnace tube. Enhanced oxidation is clearly observed in the temperature range 650-850^oC. The diffusion length of oxygen atoms generated by the catalyst is found to be tens of mm.