The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[5p-C21-1~13] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

Tue. Sep 5, 2017 1:45 PM - 5:15 PM C21 (C21)

Manabu Mitsuhara(NTT), Kouichi Akahane(NICT)

2:15 PM - 2:30 PM

[5p-C21-3] Temperature Characteristics of GaAsBi/GaAs MQW LED grown by two-substrate-temperatures technique

Toui Higuchi1, Taishi Sasaki1, Akira Tsukamoto1, Eigo Ito1, Kohki Yamada1, Pallavi Patil1, Fumitaro Ishikawa1, Satoshi Shimomura1 (1.Ehime Univ.)

Keywords:GaAsBi, LED, Temperature Characteristics

Temperature characteristics of LED (light emitting diodes) having GaAsBi / GaAs multiple quantum well (MQW) fabricated by two temperature growth method as the active layer were measured. The peak of electron luminescence was observed at 1200 nm at 260 K and at 1177 nm at 170 K. The peak emission wavelength gradually shifted to the short wavelength side and its temperature coefficient was 0.26 nm / K. The full width at half maximum of the emission spectrum was about 100 nm almost independent of temperature.