[5p-PA1-1~82] 17 Nanocarbon Technology（Poster）

▲ [5p-PA1-41] Suppression of Cu Oxidation by Single-Layer Graphene
under High Temperature and High Humidity Test

〇(M2)Ploybussara Gomasang¹, Takumi Abe¹, Kenji Kawahara², Ngyen Thanh Cuong³, Hiroki Ago², Susumu Okada⁴, Kazuyoshi Ueno^1,5 (1.Shibaura Institute of Tech., 2.Kyushu Univ., 3.ICYS-Namiki, 4.Univ. of Tsukuba, 5.SIT-RCGI)

Keywords:Graphene, Cu Film, XPS

The moisture barrier properties of single-layer graphene (SLG), which was directly grown on epitaxial Cu by CVD, was investigated to study the potential of CVD-SLG barrier for Cu metallization in long-term storage memories by high temperature and high humidity (HTHH) test at 85%rh, 85^oC. Optical microscopy is used to observe the color change of a Cu film. X-ray photoelectron spectroscopy (XPS) is performed to investigate the Cu oxidation. SLG film exposes the high efficient film to against the Cu oxidation from moisture.