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[5p-PA2-14] Fabrication of α-NPD thin films by mist vapor deposition method
Keywords:mist deposition, hole transport layer, alpha-NPD
In this study, we tried to form α-NPD thin film and control its film quality on the mist vapor deposition method. In this film forming technique, films are grown by spraying atomized fine liquid particle onto the substrate under atmospheric pressure. Especially, it is possible to form a uniform films over a large area with non-vacuum, low temperature and short time. However, the film conditions are influenced by various factors such as solvents, concentration of the solution, temperature, and flow rates of transport gas and so on.
It is important to control efficiency of injection of carriers to optimize the efficiency and lifetime in OLEDs. In this study, solution process of α-NPD thin film by mist-vapor deposition was investigated. In particular, to control the surface morphology the flow rate of dilution gas during mist transport was changed. For evaluations of the obtained films, ultraviolet-visible spectroscopy measurement, photoluminescence measurement and laser microscope observation were carried out. It was revealed that the surface structure of the films changes by changing the film forming temperature and the flow rate of the transporting gas.
It is important to control efficiency of injection of carriers to optimize the efficiency and lifetime in OLEDs. In this study, solution process of α-NPD thin film by mist-vapor deposition was investigated. In particular, to control the surface morphology the flow rate of dilution gas during mist transport was changed. For evaluations of the obtained films, ultraviolet-visible spectroscopy measurement, photoluminescence measurement and laser microscope observation were carried out. It was revealed that the surface structure of the films changes by changing the film forming temperature and the flow rate of the transporting gas.