The 78th JSAP Autumn Meeting, 2017

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Oral presentation

7 Beam Technology and Nanofabrication » 7.2 Applications and technologies of electron beams

[5p-S41-1~20] 7.2 Applications and technologies of electron beams

Tue. Sep 5, 2017 1:15 PM - 6:45 PM S41 (Conf. Room 1)

Tadahiro Kawasaki(JFCC), Nobuhiro Ishikawa(NIMS), Shigekazu Nagai(Mie Univ.)

4:45 PM - 5:00 PM

[5p-S41-13] Investigation of Suitable Approximation Order of 2-variable Function of Exposure Conditions for Half-pitch 50 nm Line-and-space Pattern Formed by Electron-beam Lithography

〇Masahito Kurouchi1, Manabu Yasui1, Satoru Kaneko1 (1.KISTEC)

Keywords:Electron beam Lithography, proximity effect correction