The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.2 Applications and technologies of electron beams

[5p-S41-1~20] 7.2 Applications and technologies of electron beams

Tue. Sep 5, 2017 1:15 PM - 6:45 PM S41 (Conf. Room 1)

Tadahiro Kawasaki(JFCC), Nobuhiro Ishikawa(NIMS), Shigekazu Nagai(Mie Univ.)

5:45 PM - 6:00 PM

[5p-S41-17] Development of low work function LaB6 cathode with infiltration of carbide solution

Takaya Kobayashi1, Tomoya Yokoyama1, 〇Hidekazu Murata1, Eiji Rokuta1, Hiroshi Shimoyama1, Hiroshi Yasuda2, Yoshihisa Ooae2 (1.Meijo Univ., 2.PARAM Corp.)

Keywords:electron beam lithography, low work function, thermionic electron gun

レニウムエミッタを土台とし、その先端周辺部に粒径3 ~ 5 umのLaB6粉末体を配置し、その上に炭化物溶液を浸透させたものをエミッタとして、熱電子放出実験を行った。