The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 5, 2017 1:15 PM - 5:45 PM S42 (Conf. Room 2)

Toru Yamaguchi(NTT), Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.)

3:00 PM - 3:15 PM

[5p-S42-7] Location control of Metal Nanoparticles Using Combination of Top-down and Bottom up Nano-fabricatioon

Hiroki Yamamoto1, Bunsho Ohtani2, Takahiro Kozawa1 (1.ISIR, Osaka Univ., 2.ICAT, Hokkaido Univ.)

Keywords:Electron beam, Self-assembly monolayer, Metal nanoparticles

Metal nanoparticle is expected as small-sized electronic devices such as single electron transistors, biosensing application and so on. In order to develop novel devices and biosensing application, it is essential to construct ordered structure of the nanoparticles on solid substrate. Lithography technique is one of method for the patterning of nanostructure. Also, one of the promising methods for constructing such an ordered structure is to attach the nanoparticles chemically onto a highly order molecule layer of functional molecules such as self-assembled monolayers (SAMs), which are formed by spontaneous organization of thiolated molecules on a desired metal surface. In this study, we tried to do location control of nanoparticles using combination of top-down and bottom-up nanofabrication.