The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 5, 2017 1:15 PM - 5:45 PM S42 (Conf. Room 2)

Toru Yamaguchi(NTT), Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.)

3:15 PM - 3:30 PM

[5p-S42-8] Fabrication of a biomimetic inspired 3D mold by using acceleration and dose modulation electron beam lithography

Kohei Goto1, Taniguchi Jun1 (1.TUS)

Keywords:Nanoimprint mold, Electron beam lithography, Acceleration voltage modulation

Our previously report reveals precise depth control is possible with changing the acceleration voltage. In this study, we propose a new three-dimensional structure fabrication method combined with acceleration and dose modulation method. The target structure was a biomimetic inspired 3D funnel structure. We succeeded in producing a target three dimensional structure with three different accelerating voltages and three doses. In addition, we succeeded in obtaining a replicated pattern by UV-NIL using this structure.