11:45 AM - 12:00 PM
[6a-A201-11] Control of Thermal-Plasma-Jet Ejection Direction by Magnetic Field for Application to SiC Annealing
Keywords:semiconductor, silicon carbide, plasma jet
Presentation information
Oral presentation
15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)
[6a-A201-1~12] 15.6 Group IV Compound Semiconductors (SiC)
Wed. Sep 6, 2017 9:00 AM - 12:15 PM A201 (201)
Koji Kita(Univ. of Tokyo), Hiroaki Hanafusa(Hiroshima Univ.)