[6a-PA9-1~11] 13.3 Insulator technology

[6a-PA9-10] Surface Oxidation process of SiO_x films under humid environment

〇Tomoki Oku¹, Toshihiko Shiga¹, Masahiro Totsuka¹, Shinichi Takagi¹ (1.Mitsubishi Electric)

Keywords:humid resistance, silicon oxide, hydrolysis

The SiN_x films oxidized under high humidity environment change to SiO_x films, and the SiO_x films are further oxidized excessively. The excess oxidation mechanism of SiO_x films which are the initial process of so-called hydrolysis were analyzed by a molecular orbital calculation.