The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[6p-A201-1~20] 15.6 Group IV Compound Semiconductors (SiC)

Wed. Sep 6, 2017 1:30 PM - 7:00 PM A201 (201)

Shunta Harada(Nagoya Univ.), Masashi Kato(NITech), Takeshi Mitani(AIST)

6:45 PM - 7:00 PM

[6p-A201-20] Influence of hydrogen on single photon sources in channel region of 4H-SiC MOSFETs

Yuta Abe1, Mitsuo Okamoto2, Shinobu Onoda3, Takeshi Ohshima3, Moriyoshi Haruyama3,4, Wataru Kada4, Osamu Hanaizumi4, Shinsuke Harada2, Yohei Kagoyama1, Takahide Umeda1 (1.Univ. of Tsukuba, 2.AISt, 3.QST, 4.Gunma Univ.)

Keywords:single photon source, MOS interface, 4H-SiC

Researches on single photon sources (SPSs) for quantum-sensing applications are increasingly expanding. In channel region of 4H-SiC MOSFETs, we have found very bright SPSs operatable at room temperature. In this study, we prepared different MOSFETs that have made via different hydrogen-related processes in order to investigate a relationship between SPSs and hydrogen. Using confocal microscope, we observed a drastic increase in photoluminescence from the MOS interface, related to the hydrogen incorporation.