[6p-S41-1~10] 7.5 Ion beams

[6p-S41-5] Evaluation of sensitivity for oxygen by means of TOF-ERDA

Yuta Kajitori¹, Momomi Oishi¹, 〇Keisuke Yasuda¹, Yoichi Haruyama¹, Yoshinori Nakata², Kohtaku Suzuki² (1.Kyoto Pref. Univ., 2.WERC)

Keywords:TOF-ERDA, sensitivity, oxygen

Detection sensitivities for implanted oxygen in a silicon wafer were measured by means of TOF-ERDA. The detection limit of 3.1×10¹⁴ cm^-2 was obtained in the case of the measurement with Cu beam of 12 MeV energy, and 3.3×10¹⁵ cm^-2 in the case of the measurement with C beam of 8 MeV energy.