[7a-A402-1~10] 8.4 Plasma etching

△ [7a-A402-2] XPS Analyses for Adsorption Reactions of Hexafluoroacetylacetone (hfac) with Ni Surfaces

〇Tomoko Ito¹, Karahashi Kazuhiro¹, Hamaguchi Satoshi¹ (1.Osaka Univ.)

Keywords:magnetic material, atomic layer etching