[7a-A413-1~9] 8.1 Plasma production and control

[7a-A413-2] Investigating effect of support gas pressure for producing fullerene ion beam on ECR ion source

〇Koji Onishi¹, Yuto Tsuda¹, Takuto Watanabe¹, Tatsuto Takeda¹, Kouta Hamada¹, Takashi Uchida², Masayuki Muramatsu³, Atsushi Kitagawa³, Yoshikazu Yoshida², Yushi Kato¹ (1.Osaka Univ., 2.Toyo Univ., 3.NIRS)

Keywords:fullerene, plasma