Koji Onishi

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 11:30 AM A413 (413)

Oral presentation
| 8 Plasma Electronics
| 8.1 Plasma production and control

[7a-A413-1~9] 8.1 Plasma production and control

9:15 AM - 9:30 AM

[7a-A413-2] Investigating effect of support gas pressure for producing fullerene ion beam on ECR ion source

〇Koji Onishi¹, Yuto Tsuda¹, Takuto Watanabe¹, Tatsuto Takeda¹, Kouta Hamada¹, Takashi Uchida², Masayuki Muramatsu³, Atsushi Kitagawa³, Yoshikazu Yoshida², Yushi Kato¹ (1.Osaka Univ., 2.Toyo Univ., 3.NIRS)

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