Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[7a-A413-1~9] 8.1 Plasma production and control

Thu. Sep 7, 2017 9:00 AM - 11:30 AM A413 (413)

Akimitsu Hatta(Kochi Univ. of Tech.)

△：奨励賞エントリー
▲：英語発表
▼：奨励賞エントリーかつ英語発表
空欄：どちらもなし

+Add all to schedule

9:00 AM - 9:15 AM

[7a-A413-1] Identifying ion beam of fullerene compounds in ECR ion source and optimizing their extraction

〇Yuto Tsuda¹, Takuto Watanabe¹, Koji Onishi¹, Tatsuto Takeda¹, Takashi Uchida², Masayuki Muramatsu³, Atsushi Kitagawa³, Yoshikazu Yoshida², Yushi Kato¹ (1.Osaka univ., 2.Toyo univ., 3.NIRS)

9:15 AM - 9:30 AM

[7a-A413-2] Investigating effect of support gas pressure for producing fullerene ion beam on ECR ion source

〇Koji Onishi¹, Yuto Tsuda¹, Takuto Watanabe¹, Tatsuto Takeda¹, Kouta Hamada¹, Takashi Uchida², Masayuki Muramatsu³, Atsushi Kitagawa³, Yoshikazu Yoshida², Yushi Kato¹ (1.Osaka Univ., 2.Toyo Univ., 3.NIRS)

9:30 AM - 9:45 AM

[7a-A413-3] The critical condition of electron cyclotron resonance plasma by using 1.30/2.45GHz-band wireless microwaves source under extremely power

〇Takuto Watanabe¹, tsuda yuto¹, onishi koji¹, hamada kota¹, takeda tatsuto¹, kato yushi¹ (1.Osaka Univ.)

9:45 AM - 10:00 AM

[7a-A413-4] Enhanced production of electron cyclotron resonance plasma by plate-tuner

〇Kota Hamada¹, Takuto Watanabe¹, Yuto Tsuda¹, Koji Onishi¹, Tatsuto Takeda¹, Yushi Kato¹ (1.Osaka Univ.)

10:00 AM - 10:15 AM

[7a-A413-5] Measurement of plasma potential on ECR ion source for estimating material damage
by low energy irradiation of multi-charged Xe ion beams

〇Tatsuto Takeda¹, Yuto Tsuda¹, Takuto Watanabe¹, Koji Onishi¹, Kouta Hamada¹, Yasutaka Inanaga², Yushi Kato¹ (1.Osaka Univ., 2.Mitsubishi Electric)

10:30 AM - 10:45 AM

△ [7a-A413-6] Slow Rotation of Microwave Plasma by Amplitude Modulation

〇(M2)Masaya Hotta¹, Daisuke Ogawa¹, Keiji Nakamura¹, Soonam Park², Dima Lubomirsky², Satoru Kobayashi², Hideo Sugai³ (1.Chubu Univ., 2.Applied Materials, 3.NISRI)

10:45 AM - 11:00 AM

[7a-A413-7] Electromagnetic field simulation of power absorption by slot-excited atmospheric-pressure microwave plasma

〇Haruka Suzuki¹, Yosuke Koike¹, Yuto Tamura¹, Yoshiki Baba¹, Hirotaka Toyoda¹ (1.Nagoya Univ.)

11:00 AM - 11:15 AM

[7a-A413-8] Power absorption mechanism in atmospheric-pressure microwave line plasma

〇Yuto Tamura¹, Yosuke Koike¹, Haruka Suzuki¹, Hirotaka Toyoda¹ (1.Nagoya Univ.)

11:15 AM - 11:30 AM

△ [7a-A413-9] Relationship between density of molecular nitrogen in the metastable A3Σu+ state and temperature of discharge tube in a remote nitrogen plasma source

〇masaharu shimabayashi¹, Kazuaki Kurihara², Koichi Sasaki¹ (1.Hokkaido Univ., 2.Toshiba/Imec)

Session information

[7a-A413-1~9] 8.1 Plasma production and control

[7a-A413-1] Identifying ion beam of fullerene compounds in ECR ion source and optimizing their extraction

[7a-A413-2] Investigating effect of support gas pressure for producing fullerene ion beam on ECR ion source

[7a-A413-3] The critical condition of electron cyclotron resonance plasma by using 1.30/2.45GHz-band wireless microwaves source under extremely power

[7a-A413-4] Enhanced production of electron cyclotron resonance plasma by plate-tuner

[7a-A413-5] Measurement of plasma potential on ECR ion source for estimating material damage
by low energy irradiation of multi-charged Xe ion beams

△ [7a-A413-6] Slow Rotation of Microwave Plasma by Amplitude Modulation

[7a-A413-7] Electromagnetic field simulation of power absorption by slot-excited atmospheric-pressure microwave plasma

[7a-A413-8] Power absorption mechanism in atmospheric-pressure microwave line plasma

△ [7a-A413-9] Relationship between density of molecular nitrogen in the metastable A3Σu+ state and temperature of discharge tube in a remote nitrogen plasma source

Authentication

Session information

[7a-A413-1~9] 8.1 Plasma production and control

[7a-A413-1] Identifying ion beam of fullerene compounds in ECR ion source and optimizing their extraction

[7a-A413-2] Investigating effect of support gas pressure for producing fullerene ion beam on ECR ion source

[7a-A413-3] The critical condition of electron cyclotron resonance plasma by using 1.30/2.45GHz-band wireless microwaves source under extremely power

[7a-A413-4] Enhanced production of electron cyclotron resonance plasma by plate-tuner

[7a-A413-5] Measurement of plasma potential on ECR ion source for estimating material damage by low energy irradiation of multi-charged Xe ion beams

△ [7a-A413-6] Slow Rotation of Microwave Plasma by Amplitude Modulation

[7a-A413-7] Electromagnetic field simulation of power absorption by slot-excited atmospheric-pressure microwave plasma

[7a-A413-8] Power absorption mechanism in atmospheric-pressure microwave line plasma

△ [7a-A413-9] Relationship between density of molecular nitrogen in the metastable A3Σu+ state and temperature of discharge tube in a remote nitrogen plasma source

Authentication

[7a-A413-5] Measurement of plasma potential on ECR ion source for estimating material damage
by low energy irradiation of multi-charged Xe ion beams