The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[7a-C23-1~10] 6.4 Thin films and New materials

Thu. Sep 7, 2017 9:00 AM - 11:45 AM C23 (C23)

Yasuyuki Hikita(Stanford Univ.)

9:30 AM - 9:45 AM

[7a-C23-3] Preparation of rhodium oxide thin films by reactive sputtering and their electrochromic properties.

Chanyang Jeong1, Yoshio Abe1, Midori Kawamura1, Kyung Ho Kim1, Takayuki Kiba1 (1.Kitami Inst.)

Keywords:Rhodium oxide thin flim, Electrochromic, Reactive Sputtering

Electrochromic (EC) materials change their optical transmittance (colored and bleached) reversibly on application of a low voltage. A typical EC device consists of an EC layer, an ion-conduction layer, and an ion-storage layer, all sandwiched between two transparent conducting electrodes. Platinum group metal oxides, such as iridium (Ir) oxide and specific rhodium (Rh) oxide, are considered to be promising EC materials because of their high chemical stability. However, studies on the EC properties of Rh oxide are very scarce. In this study, rhodium oxide thin films were deposited by reactive sputtering, and their structure and EC properties were evaluated.