[7a-PA5-1~22] 3.8 Optical measurement, instrumentation, and sensor

[7a-PA5-18] Measurement of Optical constants of SiC Wafers Using Far-infrared Lasers

〇Kazuya Nakayama¹, Shigeki Okajima¹, Tsuyoshi Akiyama², Kenji Tanaka², Kazuo Kawahata² (1.Chubu Univ., 2.NIFS)

Keywords:far infrared laser, refractive index, SiC

For fusion plasma diagnostics, we have developed a multi-channel interferometer/polarimater using two-color far-infrared (FIR) lasers. It is important to select the material of optical elements such as windows and beam splitters in this system. SiC utilized for a power semiconductor material was selected as one of the candidate materials. Optical constants (refractive index and absorption coefficient) of SiC wafers has been measured by using FIR lasers of 48, 57, 71, 96, and 119 μm in wavelength.