[7p-A402-7~23] 8.3 Plasma deposition of thin film and surface treatment

[7p-A402-22] Target state control and preparation of nickel oxide thin film by water vapor sputtering

〇(M1)Yuki Yokoiwa¹, Yoshio Abe¹, Midori Kawamura¹, Kyung Ho Kim¹, Takayuki Kiba¹ (1.Kitami Inst.)

Keywords:oxide nickel thin film, sputtering, electrochromic

In the reactive sputtering method, a metal target is sputtered in a reactive gas to form a compound thin film. In this method, when the metal target is exposed to the plasma of the reaction gas, compound layer is often formed on the target surface. In this study, a nickel oxide thin film was prepared by using water vapor as reactive gas, and the target state was studied.