[7p-C19-1~10] Challenges for 'multi-scale' processing - dry, wet, or else?...

[7p-C19-1] Challenges for multi-scale processing - opening address -

〇TOSHIYUKI SANADA¹ (1.Shizuoka Univ.)

Keywords:semiconductor device manufacturing

In this symposium, we will review the roles of dry and wet technologies used in the semiconductor device manufacturing process, and discuss the future technology to solve the multi-scale process. In this presentation, I will introduce the background on each talk as its opening.