The 78th JSAP Autumn Meeting, 2017

Presentation information

Symposium (Oral)

Symposium » Challenges for 'multi-scale' processing - dry, wet, or else?...

[7p-C19-1~10] Challenges for 'multi-scale' processing - dry, wet, or else?...

Thu. Sep 7, 2017 1:45 PM - 5:25 PM C19 (C19)

Kazuyoshi Ueno(Shibaura Inst. of Tech), Toshiyuki Sanada(Shizuoka Univ.)

3:50 PM - 4:20 PM

[7p-C19-6] Semiconductor processes using multi-scale supercritical media

Eiichi Kondoh1 (1.Univ. Yamanashi)

Keywords:supercritical fluid

Supercritical fluids are compressive and high-density media that have a good penetration and transportation capability. Such superior properties are ideal for processing features having a wide range of dimensions from nanometer scale to micrometer scale. In silicon processing, application of supercritical fluids to drying, cleaning, deposition, and etching has been proposed. In this talk, characteristics of supercritical fluids are overviewed in terms of semiconductor process applications.