The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[7p-C23-1~22] 6.4 Thin films and New materials

Thu. Sep 7, 2017 1:45 PM - 7:30 PM C23 (C23)

Tetsuo Tsuchiya(AIST), Hiroshi Murotani(Tokai University)

5:15 PM - 5:30 PM

[7p-C23-14] Tribological formation of chalcogenide layered semiconductor MoS2 thin film on stainless steel surface

Takafumi Ito1, Tadao Tanabe1, Yutaka Oyama1 (1.Tohoku Univ.)

Keywords:semiconductor, molybdenum disulfide, tribology

A novel fabrication process of layered materials has been proposed on tribochemical reaction. Our target is formation of chalcogenide layered semiconductor, molybdenum disulfide (MoS2), using tribological chemical reaction of Molybdenum dialkyldithiocarbamates(MoDTC) to MoS2. MoS2 is expected as an semiconductor for a field effect transistor(FET) with higher speed and lower electric power. This study investigated surface reaction activity of MoDTC to MoS2 on various stainless steal surface.