[8a-C16-1~17] 17.2 Graphene

[8a-C16-4] Graphene Growth in Oxidizing Environment by Carbon Dioxides

〇Satoru KANEKO^1,4, Shigeo YASUHARA², Kazuo SATOH³, Manabu YASUI¹, Masahito KUROUCHI¹, Satomi TANAKA¹, Chihiro KATO¹, Akifumi MATSUDA⁴, Mamoru YOSHIMOTO⁴ (1.KISTEC, 2.JAC, 3.ORIST, 4.Tokyo Inst. Tech.)

Keywords:carbon dioxides, graphene, pulsed laser deposition

Many methods are proposed and actually have used to prepare graphene film such as thermal decomposition of silicon carbide (SiC), and chemical vapor deposition (CVD) method. However the CVD method requires metal catalyst (Cu, Ni), and films are required to transfer onto insulating substrates for device fabrications. Another interesting method employs pencils and paper. Paper sheet drown using a lead pencil is irradiated by femtosecond laser, and graphitic materials remain on the paper sheet. In this presentation, yet another method using pulsed laser deposition (PLD) in carbon oxide will be proposed.