[8a-PA1-1~17] 6.2 Carbon-based thin films

[8a-PA1-13] Fabrication and structural analysis of high-nitrogen containing a-CN_x:H thin films using radio-frequency plasma CVD of CH₃CN-N₂-Ar gas mixture

〇Yoshiki Iizawa¹, Hidetoshi Saitoh¹, Haruhiko Ito¹ (1.Nagaoka Univ. of Tech.)

Keywords:carbon nitride, radio-frequency plasma CVD, RF plasma CVD