9:30 AM - 11:30 AM [8a-PA1-13] Fabrication and structural analysis of high-nitrogen containing a-CNx:H thin films using radio-frequency plasma CVD of CH3CN-N2-Ar gas mixture 〇Yoshiki Iizawa1, Hidetoshi Saitoh1, Haruhiko Ito1 (1.Nagaoka Univ. of Tech.)