[8a-PA2-1~17] 6.4 Thin films and New materials

[8a-PA2-16] Atomic scale characterization of MOCVD grown TMDC monolayer by STM

〇(M1)Kota Murase¹, Yu Kobayashi², Shoji Yoshida¹, Osamu Takeuchi¹, Yasumitsu Miyata², Hidemi Shigekawa¹ (1.Tsukuba Univ., 2.Tokyo Metropolitan Univ.)

Keywords:Transition metal dichalcogenide (TMD), Scanning tunneling microscopy (STM), Chemical vapor deposition (CVD)