[8a-PA4-1~31] Joint Session K "Wide bandgap oxide semiconductor materials and devices"（Poster）

[8a-PA4-21] Epitaxial ε-In_2xGa_2-2xO₃ thin films grown by mist chemical vapor deposition

〇Nobutaka Miyauchi¹, Daisuke Tahara¹, Shota Morimoto¹, Hiroyuki Nishinaka¹, Masahiro Yoshimoto¹ (1.Kyoto Inst. of Tech.)

Keywords:Gallium oxide, Mist CVD